Characterization of Defect Induced Multilayer Graphene

Marriatyi Morsin, Suhaila Isaak, Marlia Morsin, Yusmeeraz Yusof


A study of oxygen plasma on multilayer graphene is done with different flow rates. This is to allow a controlled amount of defect fabricated on the graphene. Results from the study showed that the intensity ratio of defect between D peak and G peak was strongly depended on the amount of oxygen flow rate thus affected the 2D band of the spectra. The inter-defect distance LD ≥ 15 nm of each sample indicated that low-defect density was fabricated. The surface roughness of the multilayer graphene also increased and reduced the conductivity of the multilayer graphene.


multilayer graphene, oxygen plasma, raman spectroscopy, reactive ion etching

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ISSN 2088-8708, e-ISSN 2722-2578