Relationship of drain induced barrier lowering and top/bottom gate oxide thickness in asymmetric junctionless double gate MOSFET

Hakkee Jung

Abstract


The relationship of drain induced barrier lowering (DIBL) phenomenon and channel length, silicon thickness, and thicknesses of top and bottom gate oxide films is derived for asymmetric junctionless double gate (JLDG) MOSFETs. The characteristics between the drain current and the gate voltage is derived by using the potential distribution model to propose in this paper. In this case, the threshold voltage is defined as the corresponding gate voltage when the drain current is (W/L) × 10-7 A, and the DIBL representing the change in the threshold voltage with respect to the drain voltage is obtained. As a result, we observe the DIBL is proportional to the negative third power of the channel length and the second power of the silicon thickness and linearly proportional to the geometric mean of the top and bottom gate oxide thicknesses, and derive a relation such as DIBL =25.15ηL_g^(-3) t_si^2 √(t_ox1∙t_ox2 ), where η is a static feedback coefficients between 0 and 1. The η is found to be between 0.5 and 1.0 in this model. The DIBL model of this paper has been observed to be in good agreement with the result of other paper, so it can be used in circuit simulation such as SPICE.

Keywords


Asymmetric; Junctionless; DIBL; Oxide thickness; Double gate



DOI: http://doi.org/10.11591/ijece.v11i1.pp%25p
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ISSN 2088-8708, e-ISSN 2722-2578